RF electrode for a process tube of semiconductor manufacturing apparatus



FIG. 1 is a front view of a RF electrode for a process tube ofsemiconductor manufacturing apparatus showing our new design;

FIG. 2 is a back view thereof;

FIG. 3 is a plan view thereof;

FIG. 4 is a left side view thereof;

FIG. 5 is a right side view thereof;

FIG. 6 is an enlarged sectional view taken along with line VI—VI of FIG.1;

FIG. 7 is an enlarged sectional view taken along with line VII—VII ofFIG. 1;

FIG. 8 is a perspective view as seen from the front side thereof;

FIG. 9 is a reference drawing showing a state of use of a RF electrode;and,

FIG. 10 is a reference drawing showing a state of use of a RF electrode.

The ornamental design for a RF electrode for a process tube ofsemiconductor manufacturing apparatus, as shown and described.